Processing Procedures for Holographic Photoresist Plates

 

TOWNE TECHNOLOGIES, INC.

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USA

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STORAGE OF UNEXPOSED PLATES

Unexposed plates should be stored in light proof boxes at 70ºF (21ºC) at 40 to 45% relative humidity. Plates stored in this manner should remain good for a minimum of 6 months.

EXPOSURE

Exposure varies with both the equipment and layout. Specific exposure time is usually determined by a trial and error method.

The 3 most common lasers for exposing photoresist plates are:

Krypton (413nm)

Helium-Cadmium (441nm)

Argon (457nm)

DEVELOPMENT

Develop using Shipley 303 developer mixed 5 parts distilled (or de-ionized) water to 1 part developer.

Place the plate in a tray of developer, and agitate constantly for 7 to 10 seconds. Remove the plate and rinse immediately with DI Water using a low power spray nozzle to stop developing. Continue to rinse in the same manner for about 2 minutes.

Experienced holographers will experiment with developer concentration and developing time to achieve varying results.

DRYING

Dry the plate quickly and completely to avoid water spots. The best method is to blow the plate dry with a high pressure stream of compressed Nitrogen. Dry, filtered, compressed air will work as a second choice.

STORAGE OF FINISHED PLATES

Developed plates are still sensitive to light. They should be stored in light proof boxes. Inspection time under white light should be kept to a minimum.

ADDITIONAL INFORMATION

Some additional exposure information from Shipley Corporation can be found here.

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